Hilary Uche Igwe, Emmanuel I. Ugwu
A tin oxide thin film was prepared by chemical bath deposition technique, deposited on glass substrates using 5mls of 1m of SnCl22H2O and 1ML of 1M of NaOH solution with triethanolamine (TEA) as the complexing agent. The films were subjected to post deposition annealing under various temperatures, 100, 150, 200,300 and 3990C. Found to be firmly adhered to the substrate and resistant to chemicals wear. The transmittance is between 57% and 95% while the reflectance is between 4% and 19%. The band gaps obtained under various thermal treatments are between 1.40eV and 3.2eV. The refractive index is between 0.00 and 3.00. The thickness achieved is in the range of 0.12-0.14μm. These properties of the oxide film make it suitable for application in solar cell fabrication, gas sensor devices, transparent electrodes for panel displays, etc.
English 
Spanish 
Chinese 
Russian 
German 
French 
Japanese 
Hindi